Photoresists
Nitrogen Diffuser
$
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Axoft Materials diffuser ensures an inert nitrogen environment during UV curing when using contact mask aligner photolithographic systems. The hollow circular device, with multiple interior holes, seals and ejects a steady nitrogen stream over the wafer during UV exposure. Our diffuser connects directly to cleanroom nitrogen sources. Available in 3" and 4" sizes for corresponding wafer holders, with custom options also offered.

New Customer: Ask us about the starter pack deal that includes 100g of any Fleuron™ photoresist, 100g of a developer of your choice, and a Diffuser.

Contact us at materials@axoft.us for more details.

Please Note: For R&D purposes only

Benefits:
  • Easily attaches to most wafer holders used on masked aligner toolsets- i.e. SUSS MA6.
  • Connects to Nitrogen line found in most clean rooms.
  • Ensures uniform and adequate Nitrogen is provided during UV exposure.
  • Designed to not interfere with wafer and/or photomask.
Key Features:
Optimized for Fleuron™
Provides optimal dose of Nitrogen during UV curing of Fleuron™ photoresists.
Easy Integration
Easily attaches to main nitrogen line in any cleanroom.
Connects Seamlessly
Does not interfere with wafer/mask interfacial contact.
Have a Question?
Explore the precision and versatility of Fleuron™, a highly adaptable soft photoresist.

For further assistance, please reach out to Axoft at materials@axoft.us.